Laue Crystal Orientation System
01 Jun 2020
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​​The Laue Crystal Orientation System in the Materials Characterisation Laboratory​

 

​​Overview

The instrument collects a high resolution X-ray diffraction pattern from the single crystal out of which the right crystallographic plane cut can be selected with excellent accuracy. It allows real-time crystal orientation down to 0.1 degrees accuracy. The system delivers an intense X-ray beam with less than 0.3 mm on sample.​


Common Research Applications

  • 2D mapping of silicon wafers

  • Detector materials e.g. InGaAs, CdTe

  • Superconductors

  • Thin films​

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Specifications

  • < 200 μm beam size

  • High brilliance X-ray generator

  • Motorised/manual goniometer and high precision stages

  • Video sample positioning/viewing camera

  • Detector: selectable exposure from 1 ms to minutes, automatic background subtraction mode, 16-bit high precision acquisition mode, 12-bit fast preview mode​


Software

The Laue image alignment software automatically detects diffraction spots and calculates spot position against a reference crystal. It also allows automatic calculation of mis orientation against goniometer and crystallographic axis and therefore does not require manual fits of distorted patterns.

Manufacturer's brochure​


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